3D Mask Effects Enhance Imaging in High-NA EUV and Hyper-NA EUV Litho (Fraunhofer, ASML)

<p>Researchers at the Fraunhofer Institute for Integrated Systems and Device Technology IISB and ASML published a technical paper titled “Benefits of three-dimensional mask (M3D) effects in high-NA and hyper-NA EUV lithography.” Excerpt: “This study aims to offer an alternative perspective on M3D ef