Researchers at National Yang Ming Chiao Tung University and TSMC published a technical paper titled “High contrast EUV imaging enabled by topological quasi phase-only masks.” Abstract Excerpt: “Here, we propose a paradigm shift in EUV PSM technology by introducing molybdenum (Mo)-based quasi phas
Researchers at National Yang Ming Chiao Tung University and TSMC published a technical paper titled “High contrast EUV imaging enabled by topological quasi phase-only masks.” Abstract Excerpt: “Here, we propose a paradigm shift in EUV PSM technology by introducing molybdenum (Mo)-based quasi phase-only masks (quasi-POMs) with high reflectivity and minimal absorption. Through rigorous electromagnetic simulations,... » read more The post Molybdenum Quasi Phase-Only Masks Improve EUV Imaging (NYCU, TSMC) appeared first on Semiconductor Engineering .